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Low-Frequency Noise in III-V Nitride 2D Electron and Hole Gases

dc.contributor.authorLeclerc, Nima
dc.date.accessioned2021-02-15T14:44:31Z
dc.date.available2021-02-15T14:44:31Z
dc.date.issued2020-05-23
dc.description.abstractFollowing the use of the Mg-doped GaN for p-channel transistor channels, the manipulation of holes and their interactions with phonons, impurities, and dislocations remains a fundamental challenge. p-channel GaN electronics have received recent interest due to the relatively high hole mobility in AlN-GaN polarization induced two-dimensional hole gases (2DHGs). Although the mobility-limiting scattering mechanisms in 2DHGs is understood, the origins of 1/f noise in these channels is not. We introduce a characterization technique and stochastic model to identify 1/f noise mechanisms in a two-dimensional electron gas which can be extended to the 2DHG.en_US
dc.identifier.doihttps://doi.org/10.7298/2p3y-9q97
dc.identifier.urihttps://hdl.handle.net/1813/102812
dc.language.isoen_USen_US
dc.rightsCC0 1.0 Universal*
dc.rights.urihttp://creativecommons.org/publicdomain/zero/1.0/*
dc.titleLow-Frequency Noise in III-V Nitride 2D Electron and Hole Gasesen_US
dc.typedissertation or thesisen_US

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